Sputtering and depth profiling ion beam
The C60-20S is a high-performance ion beam designed for sputtering surfaces with minimal damage, and reduced preferential sputtering effects.
Operating at voltages up to 20kV, the C60-20S effectively sputters material with minimal damage without re-deposition of carbon.
Ideal as an upgrade component for XPS, AES, and SIMS, C60 provides uniform sputtering across a wide range of materials.
- High current density for faster etching
- Reduced chemical damage over monatomic beams
- Uniform sputter rates across different materials and crystal orientations
- Gate valve for quick and easy servicing
- Long lifetime source