Time-of-Flight Secondary Ion Mass Spectrometry (ToF SIMS) is a powerful surface analysis technique used to study the chemical composition of solid surfaces and thin films in three dimensions. Ion beams are central to TOF SIMS, as a beam of primary ions generates the secondary ions by bombarding a target surface.
Ionoptika pioneered using gas cluster ion beams (GCIB) for TOF SIMS applications with the J105 SIMS. GCIBs are very gentle and cause almost no damage, allowing the analysis of more sensitive samples. This has caused an explosion of new applications, particularly in the life sciences.
Explore applications of the J105 SIMS and our ion beams for TOF SIMS below.
3D TOF SIMS image of multi-layer glass coating. The potassium signal reveals two “tunnels” through the layer just a few microns wide. TOF SIMS data is characterised by high spatial resolution and chemical sensitivity, especially when using cluster ion beams.