Q-One

Advanced platform for quantum and nanoscale materials engineering

Q-One™ is a state-of-the-art focused ion beam platform for advanced device fabrication and nanoscale materials engineering. Featuring deterministic single ion implantation, Q-One is the world’s first instrument specifically designed to meet the demanding requirements of quantum research.

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Key Features:

High-resolution mass-filtered focused ion beam
Deterministic single ion detection with up to 98% detection efficiency
Choice of liquid metal or plasma ion source
Best-in-class ion selection and a wide range of implant species
Femtoamp beam currents for accurate single-ion events
Nanometre-precision stage with up to 6-inch wafer handling
Proprietary implantation and lithography software

Photo of Q-One single ion implantation instrument.

Ion Implantation: 101

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From quantum computing to materials science, learn more about the applications of Q-One.

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Ion Implantation: 101

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Deterministic Implantation

Deterministic single-ion implantation means placing a single ion into a substrate with incredible accuracy and knowing that implantation has occurred. Q-One uses DetectION™ technology, Ionoptika’s ultra-sensitive post-implant detection system, to detect the signals generated upon each ion impact.

Without the means to detect each implant event, implanting single ions with precision would not be possible. The DetectION™ system offers speed and scalability and requires no complex pre-fabrication. So you can choose the implant species and target material without hindrance.

$Graph of average number of ions per pulse against the fraction of detected pulses with no events, demonstrating a single ion detection efficiency of 98 percent.$

The DetectION™ system

Illustration of Q-One DetectION Single ion detection system

The DetectION™ system

Illustration of the Q-One Single ion detection system

A Wide Range of Species

Q-One offers a wide range of elements for implantation. The liquid metal ion source (LMIS) technology generates multiple ions of different elements in a single source, including clusters and multiply charged species.

Several alloy compositions are available, including silicon, erbium, neodymium, gold, and bismuth. Using our years of expertise, we ensure that each source flows optimally for maximum stability. A separate plasma ion source is also available for hydrogen, nitrogen, oxygen, and other gaseous elements.

Illustration of the Q-One Wien mass filter.

Graph of Q-One Wien filter voltage against beam current showing neodymium isotopes.

The Wien Filter. Perpendicular electric (E) and magnetic (B) fields filter particles based on their velocity, allowing only the species of interest through.

Left: Wien filter scan of a neodymium source. Q-One features best-in-class ion selection down to individual isotopes (m/Δm = 300).

Below: Wien filter scan of a neodymium source. Q-One features best-in-class ion selection down to individual isotopes (m/Δm = 300).

Ground-breaking innovations enable the implantation of single ions into a twenty-nanometre area with up to 98% confidence.

Close up image of Q-One single ion implantation instrument from Ionoptika

Application

Quantum Technology

Single impurity atoms embedded in a semiconductor matrix show great promise as quantum bits (qubits). Capable of producing vast arrays of identical qubits, single ion implantation is a key route to repeatable manufacture of these and other quantum devices.

However, the tolerances are extreme – each atom must be placed very precisely, sometimes as little as 20 nm from its neighbour. Q-One is the only tool designed for this application with specifications targeted at these extreme requirements.

Application

Doping Nanomaterials

Q-One is not limited to implanting single ions. Implant with any desired ion dose into any location, and even implant custom areas or shapes using the proprietary software.

Doping nanomaterials such as nanowires or quantum dots with different elements can alter their properties. Q-One opens up a world of possibilities by allowing you to target individual nanomaterials and explore different behaviours using a wide variety of dopants.

Application

Ion Lithography

Q-One allows the user to perform direct-write lithography, just like a normal FIB, but with a wider range of species and greater control over ion dose. Use heavy elements such as bismuth for highly efficient sputtering or light elements such as hydrogen for resist-based ion lithography, even down to single-ion events.

Q-One

Key Features:

Ion Implantation: 101

Publications

Discover applications

Deterministic Implantation

The DetectION™ system

The DetectION™ system

A Wide Range of Species

Quantum Technology

Doping Nanomaterials

Ion Lithography

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