Advanced Platform for Nanoscale Ion Implantation

Q-OneTM is a state-of-the-art tool for deterministic single ion implantation with nanoscale precision. A completely new design, this powerful FIB enables positioning of single ions with incredible accuracy and unprecedented speed. Featuring a host of powerful features, the Q-OneTM is the most advanced system for fabrication of quantum devices and advanced materials engineering.

Key Features

  • Deterministic single ion implantation
  • 25 kV liquid metal ion source
  • 20 nm ion column
  • Implant a wide range of elements
  • Nanometre-precision stage
  • Optional dual-beam configuration
  • 6-inch wafer handling with load-lock