Gas Cluster Ion Beams
Gas cluster ion beams (GCIB) are beams of cluster ions, ideal for sputtering and SIMS analysis of organic matter. GCIBs are highly versatile and can adjust to an experiment’s needs by varying the cluster species, size, and energy.
In the early 2000s, Yamada et al. were the first to discover the excellent low-damage sputtering properties of GCIBs. Since then, the applications of GCIBs have snowballed, from surface cleaning and low-damage etching to uncovering secrets of cell metabolism.
The first and most common gas species for GCIBs is argon. Its inert nature makes it an excellent choice for etching and cleaning applications. However, as GCIBs began to be used for SIMS applications, new gas species emerged, including CO2 and, most recently, H2O. The reactive nature of these species improves the secondary ion yield up to 500 times, greatly enhancing the technique’s sensitivity.
Explore our range of GCIBs and their applications below.
Mass spectrum of mouse brain tissue acquired on the J105 SIMS with the GCIB 70. Gas Cluster Ion Beams significantly increase the yield of high-mass ions, such as lipids, producing incredibly rich spectra even when imaging at 1.5 μm.