What is Ion Implantation?
Matt
Ion implantation is a process whereby dopant ions are accelerated in intense electrical fields to penetrate the surface of a material, thus changing the material’s properties. An essential technique in the semiconductor industry, it is used for modifying the conductivity of a semiconductor during the …
Ion Beams and their Applications
Ion Beams come in many shapes and sizes, with multiple source options and applications. A minefield of options awaits if you are unfamiliar with them. This application note will shed some light on Ionoptika’s range of Ion Beams to help you choose the right one …
ToF SIMS – Time of Flight Secondary Ion Mass Spectrometry
What is ToF SIMS? What is it used for, and what sort of information can it provide? Which samples are suitable (and which are not)? In this series, we will answer all these questions and more. Time-of-Flight Secondary Ion Mass Spectrometry (ToF SIMS) is a …
How the J105 SIMS works: An introductory guide
The J105 SIMS is a state-of-the-art 3D imaging ToF SIMS combining innovative design with cutting-edge science that has redefined ToF SIMS. Designed to exploit the benefits of cluster Ion Beams, the J105 delivers exceptional sensitivity to molecular ions, 3D MS imaging, and consistent performance across …
High-resolution multi-omics profiling of individual cells
In a landmark publication, Tian et al. demonstrate the feasibility of combined GCIB/C60 SIMS imaging for multi-omics profiling in the same tissue section at the single-cell level. A new approach Multi-omics data are vital to understanding normal regulatory processes and are essential for designing new …
Cocaine metabolite imaging in fingerprints with Water Cluster SIMS
Detection of drug compounds and their metabolites in natural environments is a critical topic for both forensic and pharmaceutical applications, and requires overcoming some of the limitations in existing microscopic and analytical techniques. Time of Flight Secondary Ion Mass Spectrometry (ToF SIMS) is a powerful …
GCIB-SEM: 3D electron microscopy with < 10nm isotropic resolution
GCIB-SEM is a new technique that combines high resolution electron microscopy with the damage free sputtering of gas cluster ions to produce incredible 3D tomography with less than 10 nm isotropic resolution. Over the last two decades, Gas Cluster Ion Beams (GCIB) have become increasingly …
Why you shouldn’t overlook C60 beams just yet
C60 cluster Ion Beams are a fantastic tool for analyzing both hard and soft materials. Composed of sixty carbon atoms arranged into a football shape, C60 ions combine several different features making it a great all-rounder Ion Beam. This is why we always recommend customers …
Drug detection with high-sensitivity using ToF SIMS
The high attrition rate of pharmaceutical drug compounds adds enormously to the cost of those that make it to market, so there is an urgent and growing need to identify failure at earlier stages of drug development. In order to do so, researchers require as …
High-resolution molecular imaging ToF SIMS
Historically ToF SIMS has not been sensitive to intact molecules due to the excessive fragmentation caused by the primary Ion Beam. Now however, thanks to the progress in gas cluster Ion Beam (GCIB) technology over the last decade, sensitivity to intact molecular species in ToF …
