What is Ion Implantation?
Ion implantation is a process whereby dopant ions are accelerated in intense electrical fields to penetrate the surface of a material, thus changing the material’s properties. An essential technique in the semiconductor industry, it is used for modifying the conductivity of a semiconductor during the …
ToF SIMS – Time of Flight Secondary Ion Mass Spectrometry
What is ToF SIMS? What is it used for, and what sort of information can it provide? Which samples are suitable (and which are not)? In this series, we will answer all these questions and more. Time-of-Flight Secondary Ion Mass Spectrometry (ToF SIMS) is a …