High-brightness Xenon Plasma FIB
The IOG 30ECR is a low-power, high-brightness plasma FIB system. Based on the principle of electron cyclotron resonance, the ion source produces high beam currents up to 200 nA and can run a range of gas sources including Xe, ideal for high-throughput FIB milling free of Ga contamination.
A distinct advantage of the ECR source is the lack of consumable or wearing parts in the source, delivering a stable beam and long service intervals.
The IOG 30ECR may run on Ar, Xe, N2, or O2, and a mass filter is included in the column to separate beams of different mass/charge species. A selection of 5 apertures allows a wide current range.
- 30 kV high-brightness plasma source
- 200 nA maximum current
- 300 nm spot size
- Runs on Xe, Ar, O2, or N2
- Low-power ion source – no need for water cooling
- Integrated mass filter
- Long service intervals and low maintenance