GCIB 10S

Damage-free sputtering and depth profiling

The GCIB 10S from Ionoptika is a high-performance gas cluster ion beam solution delivering rapid, low-damage sputtering in a feature-packed, low-maintenance package, making it an ideal upgrade for any instrument or vacuum setup.

Request Brochure

Key Features:

10 kV argon cluster ion source
Selectable clusters from Ar1 to > Ar3000
Damage-free etching of organic and inorganic materials
Rapid cleaning of hard materials
Real-time cluster measurement & adjustment
Sample current imaging
Gate valve for quick & easy servicing
Large spot size and wide scan field for even removal of material

Upgrade to the benefits of cluster ion sputtering

Gas Cluster Ion Beams impact a surface with very low energy, down to as little as 1 eV per atom.
At such low energies they sputter material without modifying the surface chemistry, i.e. without breaking bonds.
Low energy sputtering removes just a few nanometres of material at a time, for extremely high-resolution depth profiling.
Cluster beams sputter organic, soft material faster than inorganic, hard materials – ideal for cleaning hard surfaces prior to analysis.

GCIB (gas cluster ion beam) sputtering illustration

The GCIB 10S at a glance

The GCIB 10S is an ideal upgrade component for vacuum instrumentation

The ideal upgrade for your instrument

The GCIB 10S offers a bolt-on upgrade path to bring the power of cluster beam sputtering to your existing instrumentation. With a standard interface, a complete pumping system, and stand-alone software, the GCIB 10S is easily installed directly on most vacuum instrumentation, from XPS and SIMS, to electron microscopes, Auger, and more, or can be added to a prep-chamber.

With a web-socket based API, the system can also be fully integrated into third-party software. To date we have installed on instruments from Thermo Scientific, Physical Electronics, Kratos Analytical, SPECS, Scienta Omicron, PREVAC, ZEISS, and JEOL, and have agreements in place with many OEMs.

Powerful results on every material

The GCIB 10S is a powerful tool for damage-free depth profiling of polymers, organics, and other soft materials, delivering consistently superior results over
monatomic beams.

Also useful on hard surfaces, the GCIB 10S removes adventitious carbon and other surface contamination without damaging the substrate, while fast, damage-free depth profiling of ceramics can be achieved using small clusters.

Comparison of PET C 1s peaks using argon GCIB vs monatomic argon.

the GCIB features real-time cluster size measurement

Features that let you take control

Need a specific set of conditions? No problem. Unlike other gas cluster beams, the GCIB 10S lets you take complete control of the experiment. With real-time cluster measurement, cluster size can be tuned to your needs and the settings saved for later use for maximum flexibility.

Built-in imaging system

The GCIB 10S comes with built-in sample current imaging to assist with beam and sample alignment, focusing, as well as raster field calibration. Simply connect the sample current output into the GCIB 10S electronics and start imaging!

GCIB 10S

Key Features:

Upgrade to the benefits of cluster ion sputtering

The GCIB 10S at a glance

The ideal upgrade for your instrument

Powerful results on every material

Features that let you take control

Built-in imaging system

Read our Application note on GCIB-SEM

Contact Us

Navigate

Follow Us