Damage-free sputtering and depth profiling

The GCIB 10S from Ionoptika is a high-performance gas cluster ion beam solution delivering rapid, low-damage sputtering in a feature-packed, low-maintenance package, making it an ideal upgrade for any instrument or vacuum setup.

Key Features:

  • 10 kV argon cluster ion source
  • Selectable clusters from Ar1 to > Ar3000
  • Damage-free etching of organic and inorganic materials
  • Rapid cleaning of hard materials
  • Real-time cluster measurement & adjustment
  • Sample current imaging
  • Gate valve for quick & easy servicing
  • Large spot size and wide scan field for even removal of material