Sputtering and depth profiling ion beam

The C60-20S is a high-performance ion beam designed for sputtering surfaces with minimal damage, and reduced preferential sputtering effects.

Operating at voltages up to 20kV, the C60-20S effectively sputters material with minimal damage without re-deposition of carbon.

Ideal as an upgrade component for XPS, AES, and SIMS, C60 provides uniform sputtering across a wide range of materials.

Key Features:

  • High current density for faster etching
  • Reduced chemical damage over monatomic beams
  • Uniform sputter rates across different materials and crystal orientations
  • Gate valve for quick and easy servicing
  • Long lifetime source