J Series III
ADVANCED, PRECISE, AND ADAPTABLE
J Series III
PUSHING THE BOUNDARIES
Our most innovative solution yet.
The J Series III takes Ionoptika’s J105 Cluster SIMS to a new level. It offers 2D and 3D molecular and elemental imaging with a high mass range, consistently high mass resolving power, and unsurpassed sensitivity.
Developed originally to use Gas Cluster Ion Beams (GCIB) for ToF-SIMS, the J Series III creates a vast range of experimental conditions. From high-energy small Ar clusters, ideal for reducing preferential sputtering of hybrid materials, to giant water clusters to lift intact proteins from biological samples, it offers precision and consistency.
What’s more, with the unique 70kV GCIB and the ability to add C60 clusters, plasma, and liquid metal columns, there’s no need to compromise.
Want to find out more about the J Series III? Request a brochure today.
A FEATURE-RICH SOLUTION
What the J Series III offers you:
Consistently high mass resolving power across all sample types.
Up to three analysis guns including the unique 70 kV GCIB, water source, and high-performance plasma gun.
NEW long-term cryo system, significantly reducing LN2 consumption for multi-day cryo analysis.
NEW sample stage with a larger analysis area.
Superb Z-resolution for 3D imaging and depth profiling.
Significantly increased transmission, offering unsurpassed sensitivity.
Learn more about how the J Series III works in practice.
Large clusters give rise to very low e/n.
This means that when they are used to bombard a surface, they:
Significantly reduce fragmentation. This means that lifting off high molecular weight species such as lipids, peptides, and even small proteins becomes entirely feasible.
Reduce subsurface damage and inter-layer mixing.
All of this results in 3D depth profiling and imaging being not just possible but simple. When you use GCIB as the primary beam for analysis, there is no requirement to clean or remove damaged layers.
Furthermore, no etch-only cycle is needed, and all sputtered secondary ions are simultaneously sputtered and analysed, giving rise to superior depth resolution and profiling.
70kV GCIB optimises high-energy etching.
The 70kV GCIB facilitates work with smaller, dense, high-energy clusters at very high total beam energy. With these, it’s possible to etch through materials whilst reducing preferential sputtering. The smaller clusters with a higher e/n are optimal for mixed and hybrid materials like perovskites, OLEDs, and glass.
GCIB SIMS enables precise 3D analysis for biological samples.
Traditional ToF SIMS is seldom used for biological samples. This is because of the high energy, monoatomic Ion Beams, which fragment the high molecular weight species of interest to biologists, such as lipids, peptides, and small proteins.
However, the alternative soft ionisation techniques are also suboptimal. Samples are often treated with a matrix, 3D imaging is impossible, and analysis is at room temperature.
Using GCIB SIMS, the J Series III offers the best of both worlds. It benefits from spatial resolution, low fragmentation, low damage, and 3D analysis, all in cryogenic conditions.
MODULAR AND ADAPTABLE
The J Series III can be configured for your application.
The J Series III is available with a choice of up to three Primary Analysis Beams.
