Q-One
INNOVATIVE FABRICATION PLATFORM
Q-One
An advanced platform for quantum and nanoscale materials engineering.
Q-One is a state-of-the-art focused Ion Beam platform for advanced device fabrication and nanoscale materials engineering. Featuring deterministic single-ion implantation, Q-One is the world’s first instrument specifically designed to meet the demanding requirements of quantum research.
Want to find out more about the Q-One? Request a brochure today.
Why not read about how the Q-One works in practice?
KEY FEATURES AND BENEFITS
What the Q-One offers you:
High-resolution 20nm mass-filtered focused Ion Beam.
Deterministic single ion detection with up to 98% detection efficiency.
Choice of liquid metal or plasma ion source.
Best-in-class ion selection and a wide range of implant species.
Femtoamp beam currents for accurate single ion implantation.
Nanometre-precision stage with up to 6-inch wafer handling.
Proprietary implantation software.
PRECISION ION DETECTION
Deterministic implantation.
Deterministic single-ion implantation means placing a single ion into a substrate with incredible accuracy and knowing that implantation has occurred. Q-One uses DetectION™ technology. This is our own ultra-sensitive post-implant detection system, which detects the signals generated upon each ion impact.
Implanting single ions with precision would be pointless without the means to detect each implant event. The DetectION™ system offers speed and scalability and does not require complex pre-fabrication. This means you can choose the implant species and target material without hindrance.
The DetectION™ system
DIVERSE ION SELECTION
A wide range of species.
Q-One offers a wide range of elements for implantation. The liquid metal ion source (LMIS) technology generates multiple ions of different elements in a single source. This includes clusters and multiply charge species.
Many novel alloy compositions are available, including silicon, erbium, neodymium, gold, and bismuth. Using our years of expertise, we ensure that each source flows optimally for maximum stability. A separate plasma ion source is also available for hydrogen, nitrogen, oxygen, and other gaseous elements.
The Wien Filter
Q-One features best-in-class ion selection down to individual isotopes (m/Δm = 300).
Ground-breaking innovations enable the implantation of single ions into a twenty-nanometre area with up to 98% confidence.
A RANGE OF USES
How the Q-One can be applied.
Quantum technology
Single impurity atoms embedded in a semiconductor matrix show great promise as quantum bits (qubits). Capable of producing vast arrays of identical qubits, single ion implantation is a crucial route to repeatable manufacture of these and other quantum devices.
However, tolerances are extreme. Each atom must be placed precisely, sometimes as little as 20nm from its neighbour. Q-One is the only tool designed for this application with specifications targeted at these extreme requirements.
Doping nanomaterials
Q-One is not limited to implanting single ions. Implant with any desired ion dose into any location, and even implant custom areas or shapes using the proprietary software.
Doping nanomaterials such as nanowires or quantum dots with different elements can alter their properties. Q-One opens up a world of possibilities by allowing you to target individual nanomaterials and explore different behaviours using various dopants.
