Plasma Ion Beams
VARIED SOLUTIONS FOR DIFFERENT USES
Plasma Ion Beams
Plasma Ion Beams are extremely high-brightness ion sources capable of running a variety of gases. Ionoptika offers both duoplasmatron and Electron Cyclotron Resonance (ECR) source plasma Ion Beam systems.
IOG 30ECR
The IOG-30 ECR is a low-power, high-brightness plasma FIB system using electron cyclotron resonance. It offers high beam currents up to 200 nA, supports multiple gases and features a stable, long-lasting beam with minimal maintenance. It benefits from a 30kV plasma source, integrated mass filter, and wide current range.
FLIG® 5
The FLIG® 5 is a duoplasmatron Ion Beam system that delivers high current at very low energies down as far as 200eV. This makes it ideal for high-resolution shallow junction depth profiling. Its floating column maintains high energy before deceleration, ensuring minimal beam-induced mixing and contamination. The FLIG® 5 has a 200eV – 5keV energy range, mass selection, and safe venting.
IOG 30D
The IOG 30D is a high-brightness focused Ion Beam system designed for precise micro-machining and analysis. It features a duoplasmatron ion source, delivering a high-current beam (up to 500 nA) with a 500 nm spot size. Operating from 5 kV to 30 kV, it includes a mass filter and a gate valve for easy maintenance.
Product & integration information: | IOG 30D | FLIG® 5 | IOG 30D |
|---|---|---|---|
|
|
|
|
Want to find out more about the applications of our Ion Beams?
DUOPLASMATRONS AND ECR SOURCE
How different ion sources operate.
Duoplasmatron source
In a Duoplasmatron source, ions are generated as gas is slowly fed into an arc chamber, where it ignites as plasma. The plasma is then extracted and focused through the column.
The nature of the source allows for many different sources of gases to be used. Duoplasmatron Ion Beams are monatomic and do not form clusters. This results in much lower energy distributions, enabling smaller sport sizes.
ECR sources
ECR ion sources offer a low-powered alternative system. In an ECR source, the plasma is generated by an RF field superimposed on a static magnetic field, which ionises the gas molecules.
An advantage of the ECR sources is the lack of consumable or wearing parts in the source, meaning that stable Ion Beams can be maintained for long periods of time.
